Growth of atomic layer deposited ruthenium and its optical properties at short wavelengths using Ru(EtCp)2 and oxygen / Robert Müller, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz and Adriana Szeghalmi

atomic layer deposition; sputtering; ruthenium; thin film; optical properties; structural properties; soft X-ray; XUV

Saved in:
Persons: Müller, Robert [Author]; Ghazaryan, Lilit [Author]; Schenk, Paul [Author]; Wolleb, Sabrina [Author]; Beladiya, Vivek [Author]; Otto, Felix [Author]; Kaiser, Norbert [Author]; Tünnermann, Andreas [Author]; Fritz, Torsten [Author]; Szeghalmi, Adriana [Author]
Format: eArticle
Language(s):English
Publication:20. November 2018
Part of:Coatings Artikel 413
Physical description:Diagramme
ISSN:2079-6412
DOI:10.3390/coatings8110413